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Fukatsu, S, Kishimoto, Y, Ishikawa, Y, Shibata, N (2000) Si(Ge)/oxide-based heterostructures and their applications to optoelectronics. Applied Surface Science, 159. 472-480 doi:10.1016/s0169-4332(00)00153-7

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Reference TypeJournal (article/letter/editorial)
TitleSi(Ge)/oxide-based heterostructures and their applications to optoelectronics
JournalApplied Surface Science
AuthorsFukatsu, SAuthor
Kishimoto, YAuthor
Ishikawa, YAuthor
Shibata, NAuthor
Year2000 (June)Volume159
PublisherElsevier BV
DOIdoi:10.1016/s0169-4332(00)00153-7Search in ResearchGate
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Mindat Ref. ID9901976Long-form Identifiermindat:1:5:9901976:9
GUID0
Full ReferenceFukatsu, S, Kishimoto, Y, Ishikawa, Y, Shibata, N (2000) Si(Ge)/oxide-based heterostructures and their applications to optoelectronics. Applied Surface Science, 159. 472-480 doi:10.1016/s0169-4332(00)00153-7
Plain TextFukatsu, S, Kishimoto, Y, Ishikawa, Y, Shibata, N (2000) Si(Ge)/oxide-based heterostructures and their applications to optoelectronics. Applied Surface Science, 159. 472-480 doi:10.1016/s0169-4332(00)00153-7
In(n.d.) Applied Surface Science Vol. 159. Elsevier BV

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