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Park, H.J, Sun, Y.-M, Lozano, J, White, J.M (2002) Growth and thermal annealing of Cu on HfSiO4. Applied Surface Science, 201. 171-181 doi:10.1016/s0169-4332(02)00885-1

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Reference TypeJournal (article/letter/editorial)
TitleGrowth and thermal annealing of Cu on HfSiO4
JournalApplied Surface Science
AuthorsPark, H.JAuthor
Sun, Y.-MAuthor
Lozano, JAuthor
White, J.MAuthor
Year2002 (November)Volume201
PublisherElsevier BV
DOIdoi:10.1016/s0169-4332(02)00885-1Search in ResearchGate
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Mindat Ref. ID9904369Long-form Identifiermindat:1:5:9904369:6
GUID0
Full ReferencePark, H.J, Sun, Y.-M, Lozano, J, White, J.M (2002) Growth and thermal annealing of Cu on HfSiO4. Applied Surface Science, 201. 171-181 doi:10.1016/s0169-4332(02)00885-1
Plain TextPark, H.J, Sun, Y.-M, Lozano, J, White, J.M (2002) Growth and thermal annealing of Cu on HfSiO4. Applied Surface Science, 201. 171-181 doi:10.1016/s0169-4332(02)00885-1
In(n.d.) Applied Surface Science Vol. 201. Elsevier BV

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Park, H.J, Sun, Y.-M, Troiani, H, Santiago, P, Yacaman, M.J, White, J.M (2002) Growth and thermal annealing of Cu on HfO2. Surface Science, 521 (1). 1-9 doi:10.1016/s0039-6028(02)02198-2
Sun, Y.-M, Lozano, J, Ho, H, Park, H.J, Veldman, S, White, J.M (2000) Interfacial silicon oxide formation during synthesis of ZrO2 on Si(100). Applied Surface Science, 161. 115-122 doi:10.1016/s0169-4332(00)00141-0
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