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Sun, Y.-M, Lozano, J, Ho, H, Park, H.J, Veldman, S, White, J.M (2000) Interfacial silicon oxide formation during synthesis of ZrO2 on Si(100). Applied Surface Science, 161. 115-122 doi:10.1016/s0169-4332(00)00141-0

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Reference TypeJournal (article/letter/editorial)
TitleInterfacial silicon oxide formation during synthesis of ZrO2 on Si(100)
JournalApplied Surface Science
AuthorsSun, Y.-MAuthor
Lozano, JAuthor
Ho, HAuthor
Park, H.JAuthor
Veldman, SAuthor
White, J.MAuthor
Year2000 (July)Volume161
PublisherElsevier BV
DOIdoi:10.1016/s0169-4332(00)00141-0Search in ResearchGate
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Mindat Ref. ID9901997Long-form Identifiermindat:1:5:9901997:2
GUID0
Full ReferenceSun, Y.-M, Lozano, J, Ho, H, Park, H.J, Veldman, S, White, J.M (2000) Interfacial silicon oxide formation during synthesis of ZrO2 on Si(100). Applied Surface Science, 161. 115-122 doi:10.1016/s0169-4332(00)00141-0
Plain TextSun, Y.-M, Lozano, J, Ho, H, Park, H.J, Veldman, S, White, J.M (2000) Interfacial silicon oxide formation during synthesis of ZrO2 on Si(100). Applied Surface Science, 161. 115-122 doi:10.1016/s0169-4332(00)00141-0
In(n.d.) Applied Surface Science Vol. 161. Elsevier BV

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