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Kim, Byungwhan, Kim, Kunho, Lee, Byung Teak (2003) Radio frequency bias power effect on surface roughness of silicon carbide plasma etching. Applied Surface Science, 217. 261-267 doi:10.1016/s0169-4332(03)00567-1

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Reference TypeJournal (article/letter/editorial)
TitleRadio frequency bias power effect on surface roughness of silicon carbide plasma etching
JournalApplied Surface Science
AuthorsKim, ByungwhanAuthor
Kim, KunhoAuthor
Lee, Byung TeakAuthor
Year2003 (July)Volume217
PublisherElsevier BV
DOIdoi:10.1016/s0169-4332(03)00567-1Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID9905400Long-form Identifiermindat:1:5:9905400:9
GUID0
Full ReferenceKim, Byungwhan, Kim, Kunho, Lee, Byung Teak (2003) Radio frequency bias power effect on surface roughness of silicon carbide plasma etching. Applied Surface Science, 217. 261-267 doi:10.1016/s0169-4332(03)00567-1
Plain TextKim, Byungwhan, Kim, Kunho, Lee, Byung Teak (2003) Radio frequency bias power effect on surface roughness of silicon carbide plasma etching. Applied Surface Science, 217. 261-267 doi:10.1016/s0169-4332(03)00567-1
In(n.d.) Applied Surface Science Vol. 217. Elsevier BV

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Kim, Byungwhan, Lee, Byung Teak (2005) Prediction of silicon oxynitride plasma etching using a generalized regression neural network. Journal of Applied Physics, 98 (3). 34912pp. doi:10.1063/1.2001155
Kim, Byungwhan, Lee, Byung Teak (2006) Microtrench of oxynitride thin films in a C2F6 inductively coupled plasma. Applied Surface Science, 253. 1464-1468 doi:10.1016/j.apsusc.2006.02.024
Kim, Sang Sub, Moon, Jong Ha, Lee, Byung-Teak, Sohn, Kee-Sun, Kang, Tae Soo, Je, Jung Ho (2004) Microstructures of pulsed laser deposited Eu doped Y2O3 luminescent films on Si(001) substrates. Applied Surface Science, 221. 231-236 doi:10.1016/s0169-4332(03)00882-1
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(2003) Author Index. Applied Surface Science, 217. doi:10.1016/s0169-4332(03)00800-6
(2003) Subject Index. Applied Surface Science, 217. doi:10.1016/s0169-4332(03)00801-8
Yasui, Kanji, Hashiba, Masahiro, Akahane, Tadashi (2003) Radio frequency power dependence of the characteristics of 3C-SiC on Si grown by triode plasma CVD using dimethylsilane. Applied Surface Science, 216. 580-584 doi:10.1016/s0169-4332(03)00443-4
Kim, Suyean, Kim, Byungwhan (2009) Radio frequency bias power effects on silicon nitride film deposited in SiH4-NH3 using a plasma-enhanced chemical vapor deposition. Metals and Materials International, 15. 881-885 doi:10.1007/s12540-009-0881-7
Knizikevičius, R (2003) Simulation of the loading effect. Applied Surface Science, 217. 275-280 doi:10.1016/s0169-4332(03)00556-7
Kim, Byungwhan, Seo, Junhyun (2015) Measurement of surface roughness of plasma-deposited films using laser speckles. Applied Surface Science, 359. 204-208 doi:10.1016/j.apsusc.2015.10.070
 
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