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Kim, Byungwhan, Kim, Kunho (2004) Prediction of profile surface roughness in CHF3/CF4 plasma using neural network. Applied Surface Science, 222. 17-22 doi:10.1016/s0169-4332(03)00963-2

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Reference TypeJournal (article/letter/editorial)
TitlePrediction of profile surface roughness in CHF3/CF4 plasma using neural network
JournalApplied Surface Science
AuthorsKim, ByungwhanAuthor
Kim, KunhoAuthor
Year2004 (January)Volume222
PublisherElsevier BV
DOIdoi:10.1016/s0169-4332(03)00963-2Search in ResearchGate
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Mindat Ref. ID9905665Long-form Identifiermindat:1:5:9905665:4
GUID0
Full ReferenceKim, Byungwhan, Kim, Kunho (2004) Prediction of profile surface roughness in CHF3/CF4 plasma using neural network. Applied Surface Science, 222. 17-22 doi:10.1016/s0169-4332(03)00963-2
Plain TextKim, Byungwhan, Kim, Kunho (2004) Prediction of profile surface roughness in CHF3/CF4 plasma using neural network. Applied Surface Science, 222. 17-22 doi:10.1016/s0169-4332(03)00963-2
In(n.d.) Applied Surface Science Vol. 222. Elsevier BV

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Kim, Byungwhan, Kim, Sungmo (2004) Prediction of Plasma Etching Using a Classification-Based Neural Network. Journal of the Electrochemical Society, 151. doi:10.1149/1.1776593
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Kim, Byungwhan, Lee, Byung Teak (2005) Prediction of silicon oxynitride plasma etching using a generalized regression neural network. Journal of Applied Physics, 98 (3). 34912pp. doi:10.1063/1.2001155
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Kim, Byungwhan, Lee, Duk Woo, Kwon, Kwang Ho (2004) Prediction of etch microtrenching using a neural network. Journal of Applied Physics, 96 (7). 3612-3616 doi:10.1063/1.1789276
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(2004) Author Index. Applied Surface Science, 221. doi:10.1016/s0169-4332(03)01314-x
 
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