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Vrublevsky, I, Parkoun, V, Schreckenbach, J, Marx, G (2003) Effect of the current density on the volume expansion of the deposited thin films of aluminum during porous oxide formation. Applied Surface Science, 220. 51-59 doi:10.1016/s0169-4332(03)00747-5

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Reference TypeJournal (article/letter/editorial)
TitleEffect of the current density on the volume expansion of the deposited thin films of aluminum during porous oxide formation
JournalApplied Surface Science
AuthorsVrublevsky, IAuthor
Parkoun, VAuthor
Schreckenbach, JAuthor
Marx, GAuthor
Year2003 (December)Volume220
PublisherElsevier BV
DOIdoi:10.1016/s0169-4332(03)00747-5Search in ResearchGate
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Mindat Ref. ID9905511Long-form Identifiermindat:1:5:9905511:4
GUID0
Full ReferenceVrublevsky, I, Parkoun, V, Schreckenbach, J, Marx, G (2003) Effect of the current density on the volume expansion of the deposited thin films of aluminum during porous oxide formation. Applied Surface Science, 220. 51-59 doi:10.1016/s0169-4332(03)00747-5
Plain TextVrublevsky, I, Parkoun, V, Schreckenbach, J, Marx, G (2003) Effect of the current density on the volume expansion of the deposited thin films of aluminum during porous oxide formation. Applied Surface Science, 220. 51-59 doi:10.1016/s0169-4332(03)00747-5
In(n.d.) Applied Surface Science Vol. 220. Elsevier BV

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