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Hu, Lili, Li, Dejie, Fang, Guojia (2003) Influence of N2:(N2 + Ar) flow ratio and substrate temperature on the properties of zirconium nitride films prepared by reactive dc magnetron sputtering. Applied Surface Science, 220. 367-371 doi:10.1016/s0169-4332(03)00843-2

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Reference TypeJournal (article/letter/editorial)
TitleInfluence of N2:(N2 + Ar) flow ratio and substrate temperature on the properties of zirconium nitride films prepared by reactive dc magnetron sputtering
JournalApplied Surface Science
AuthorsHu, LiliAuthor
Li, DejieAuthor
Fang, GuojiaAuthor
Year2003 (December)Volume220
PublisherElsevier BV
DOIdoi:10.1016/s0169-4332(03)00843-2Search in ResearchGate
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Mindat Ref. ID9905544Long-form Identifiermindat:1:5:9905544:2
GUID0
Full ReferenceHu, Lili, Li, Dejie, Fang, Guojia (2003) Influence of N2:(N2 + Ar) flow ratio and substrate temperature on the properties of zirconium nitride films prepared by reactive dc magnetron sputtering. Applied Surface Science, 220. 367-371 doi:10.1016/s0169-4332(03)00843-2
Plain TextHu, Lili, Li, Dejie, Fang, Guojia (2003) Influence of N2:(N2 + Ar) flow ratio and substrate temperature on the properties of zirconium nitride films prepared by reactive dc magnetron sputtering. Applied Surface Science, 220. 367-371 doi:10.1016/s0169-4332(03)00843-2
In(n.d.) Applied Surface Science Vol. 220. Elsevier BV

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