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Semaltianos, N.G, Pastol, J.-L, Doppelt, P (2004) Copper chemical vapour deposition on organosilane-treated SiO2 surfaces. Applied Surface Science, 222. 102-109 doi:10.1016/j.apsusc.2003.08.003

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Reference TypeJournal (article/letter/editorial)
TitleCopper chemical vapour deposition on organosilane-treated SiO2 surfaces
JournalApplied Surface Science
AuthorsSemaltianos, N.GAuthor
Pastol, J.-LAuthor
Doppelt, PAuthor
Year2004 (January)Volume222
PublisherElsevier BV
DOIdoi:10.1016/j.apsusc.2003.08.003Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID9905621Long-form Identifiermindat:1:5:9905621:0
GUID0
Full ReferenceSemaltianos, N.G, Pastol, J.-L, Doppelt, P (2004) Copper chemical vapour deposition on organosilane-treated SiO2 surfaces. Applied Surface Science, 222. 102-109 doi:10.1016/j.apsusc.2003.08.003
Plain TextSemaltianos, N.G, Pastol, J.-L, Doppelt, P (2004) Copper chemical vapour deposition on organosilane-treated SiO2 surfaces. Applied Surface Science, 222. 102-109 doi:10.1016/j.apsusc.2003.08.003
In(n.d.) Applied Surface Science Vol. 222. Elsevier BV

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Semaltianos, N.G, Pastol, J.-L, Doppelt, P (2004) Comment to “Copper chemical vapour deposition on organosilane-treated SiO2 surfaces”. Applied Surface Science, 229. 1pp. doi:10.1016/j.apsusc.2004.04.023
Semaltianos, N.G, Pastol, J.-L, Doppelt, P (2004) Copper nucleation by chemical vapour deposition on organosilane treated SiO2 surfaces. Surface Science, 562 (1). 157-169 doi:10.1016/j.susc.2004.05.136
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