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Mitchell, D.R.G., Aidla, A., Aarik, J. (2006) Transmission electron microscopy studies of HfO 2 thin films grown by chloride-based atomic layer deposition. Applied Surface Science, 253. 606-617 doi:10.1016/j.apsusc.2005.12.133

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Reference TypeJournal (article/letter/editorial)
TitleTransmission electron microscopy studies of HfO 2 thin films grown by chloride-based atomic layer deposition
JournalApplied Surface Science
AuthorsMitchell, D.R.G.Author
Aidla, A.Author
Aarik, J.Author
Year2006 (November)Volume253
PublisherElsevier BV
DOIdoi:10.1016/j.apsusc.2005.12.133Search in ResearchGate
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Mindat Ref. ID9910051Long-form Identifiermindat:1:5:9910051:1
GUID0
Full ReferenceMitchell, D.R.G., Aidla, A., Aarik, J. (2006) Transmission electron microscopy studies of HfO 2 thin films grown by chloride-based atomic layer deposition. Applied Surface Science, 253. 606-617 doi:10.1016/j.apsusc.2005.12.133
Plain TextMitchell, D.R.G., Aidla, A., Aarik, J. (2006) Transmission electron microscopy studies of HfO 2 thin films grown by chloride-based atomic layer deposition. Applied Surface Science, 253. 606-617 doi:10.1016/j.apsusc.2005.12.133
In(n.d.) Applied Surface Science Vol. 253. Elsevier BV

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