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Zhang, Zhenyu, Liao, Longxing, Wang, Xinze, Xie, Wenxiang, Guo, Dongming (2020) Development of a novel chemical mechanical polishing slurry and its polishing mechanisms on a nickel alloy. Applied Surface Science, 506. 144670pp. doi:10.1016/j.apsusc.2019.144670

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Reference TypeJournal (article/letter/editorial)
TitleDevelopment of a novel chemical mechanical polishing slurry and its polishing mechanisms on a nickel alloy
JournalApplied Surface Science
AuthorsZhang, ZhenyuAuthor
Liao, LongxingAuthor
Wang, XinzeAuthor
Xie, WenxiangAuthor
Guo, DongmingAuthor
Year2020 (March)Volume506
PublisherElsevier BV
DOIdoi:10.1016/j.apsusc.2019.144670Search in ResearchGate
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Mindat Ref. ID9940392Long-form Identifiermindat:1:5:9940392:2
GUID0
Full ReferenceZhang, Zhenyu, Liao, Longxing, Wang, Xinze, Xie, Wenxiang, Guo, Dongming (2020) Development of a novel chemical mechanical polishing slurry and its polishing mechanisms on a nickel alloy. Applied Surface Science, 506. 144670pp. doi:10.1016/j.apsusc.2019.144670
Plain TextZhang, Zhenyu, Liao, Longxing, Wang, Xinze, Xie, Wenxiang, Guo, Dongming (2020) Development of a novel chemical mechanical polishing slurry and its polishing mechanisms on a nickel alloy. Applied Surface Science, 506. 144670pp. doi:10.1016/j.apsusc.2019.144670
In(n.d.) Applied Surface Science Vol. 506. Elsevier BV


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