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PARAMÊS, M. L.F., CONDE, O. (1993) Structure and morphology of laser assisted chemical vapour deposited TiC coatings. Le Journal de Physique IV, 3. doi:10.1051/jp4:1993329

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Reference TypeJournal (article/letter/editorial)
TitleStructure and morphology of laser assisted chemical vapour deposited TiC coatings
JournalLe Journal de Physique IV
AuthorsPARAMÊS, M. L.F.Author
CONDE, O.Author
Year1993 (August)Volume3
PublisherEDP Sciences
DOIdoi:10.1051/jp4:1993329Search in ResearchGate
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Mindat Ref. ID10296039Long-form Identifiermindat:1:5:10296039:8
GUID0
Full ReferencePARAMÊS, M. L.F., CONDE, O. (1993) Structure and morphology of laser assisted chemical vapour deposited TiC coatings. Le Journal de Physique IV, 3. doi:10.1051/jp4:1993329
Plain TextPARAMÊS, M. L.F., CONDE, O. (1993) Structure and morphology of laser assisted chemical vapour deposited TiC coatings. Le Journal de Physique IV, 3. doi:10.1051/jp4:1993329
In(n.d.) Le Journal de Physique IV Vol. 3. EDP Sciences

See Also

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WESTBERG, H., BOMAN, M., CARLSSON, J.-O. (1993) Laser-assisted chemical vapour deposition of TiSi2: aspects of deposition and etching. Le Journal de Physique IV, 3. doi:10.1051/jp4:1993330
CROONEN, Y. H., VERSPUI, G. (1993) Laser induced chemical vapour deposition of TiN coatings at atmospheric pressure. Le Journal de Physique IV, 3. doi:10.1051/jp4:1993328
SELBMANN, D., LEONHARDT, A., WOLF, E. (1991) CHEMICAL VAPOUR DEPOSITION OF Al-CONTAINING TiC - AND Ti(O,C) - HARD COATINGS. Le Journal de Physique IV, 2. doi:10.1051/jp4:1991270
Ruppi, S. (2001) Advances in chemically vapour deposited wear resistant coatings. Le Journal de Physique IV, 11. doi:10.1051/jp4:20013106
FREDRIKSSON, E., CARLSSON, J.-O. (1993) Chemical vapour deposition of Al2O3 on titanium oxides. Le Journal de Physique IV, 3. doi:10.1051/jp4:1993377
BIGELOW, L. K. (1993) Diamond coatings. Le Journal de Physique IV, 3. doi:10.1051/jp4:19937139
STUKE, M. (1993) Laser applications in CVD. Le Journal de Physique IV, 3. doi:10.1051/jp4:1993369
ALEXANDROV, S. E. (1993) Chemical vapour deposition of nitride and oxynitride dielectric films. Le Journal de Physique IV, 3. doi:10.1051/jp4:1993364
SMEETS, J., MENEVE, J., JACOBS, R., EERSELS, L., DEKEMPENEER, E. (1993) Physical and tribological properties of a-Si1-xCx : H coatings prepared by r.f. plama-assisted chemical vapour deposition. Le Journal de Physique IV, 3. doi:10.1051/jp4:1993370
CARLSSON, J.-O. (1993) Thermal and laser-activated CVD : a comparison. Le Journal de Physique IV, 3. doi:10.1051/jp4:1993327
Paramês, M.L.F, Conde, O (1997) Growth of TiC films by thermal laser-assisted chemical vapour deposition. Applied Surface Science, 109. 554-558 doi:10.1016/s0169-4332(96)00633-2
 
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