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Ruppi, S. (2001) Advances in chemically vapour deposited wear resistant coatings. Le Journal de Physique IV, 11. doi:10.1051/jp4:20013106

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Reference TypeJournal (article/letter/editorial)
TitleAdvances in chemically vapour deposited wear resistant coatings
JournalLe Journal de Physique IV
AuthorsRuppi, S.Author
Year2001 (August)Volume11
PublisherEDP Sciences
DOIdoi:10.1051/jp4:20013106Search in ResearchGate
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Mindat Ref. ID10302012Long-form Identifiermindat:1:5:10302012:1
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Full ReferenceRuppi, S. (2001) Advances in chemically vapour deposited wear resistant coatings. Le Journal de Physique IV, 11. doi:10.1051/jp4:20013106
Plain TextRuppi, S. (2001) Advances in chemically vapour deposited wear resistant coatings. Le Journal de Physique IV, 11. doi:10.1051/jp4:20013106
In(n.d.) Le Journal de Physique IV Vol. 11. EDP Sciences

See Also

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EROGLU, S., GALLOIS, B. (1993) Residual stresses in chemically vapor deposited coatings in the Ti-C-N system. Le Journal de Physique IV, 3. doi:10.1051/jp4:1993319
Stoiler, M., Fontano, G., Panzenböck, M., Mitterer, C., Lugmair, C., Kullmer, R. (2001) Wear behavior of PACVD tin coatings deposited onto tool steels. Le Journal de Physique IV, 11. doi:10.1051/jp4:20013111
Wahl, G., Metz, Ch., Samoilenkov, S. (2001) Thermal barrier coatings. Le Journal de Physique IV, 11. doi:10.1051/jp4:20013105
Yan, W., Busso, E. P., O'Dowd, N. P. (2001) A generalised sliding wear model for inhomogeneous coatings. Le Journal de Physique IV, 11. doi:10.1051/jp4:2001432
DELBLANC BAUER, A., CARLSSON, J.-O. (1991) CORROSION OF CHEMICALLY VAPOUR DEPOSITED TITANIUM CARBIDE ON AN INERT SUBSTRATE. Le Journal de Physique IV, 2. doi:10.1051/jp4:1991277
PARAMÊS, M. L.F., CONDE, O. (1993) Structure and morphology of laser assisted chemical vapour deposited TiC coatings. Le Journal de Physique IV, 3. doi:10.1051/jp4:1993329
Ruppi, S., Larsson, A. (1999) Microstructure and deposition characteristics of κ-Al2O3. Le Journal de Physique IV, 9. doi:10.1051/jp4:1999843
Ojeda, F., Cuerno, R., Salvarezza, R., Vázquez, L. (1999) Study of the growth mechanisms of low-pressure chemically vapour deposited silica films. Le Journal de Physique IV, 9. doi:10.1051/jp4:1999833
Norman, J. A.T. (2001) Advances in copper CVD for the semiconductor industry. Le Journal de Physique IV, 11. doi:10.1051/jp4:2001363
EROGLU, S., GALLOIS, B. (1993) Texture analyses of chemically vapor deposited coatings in the Ti-C-N system by wide film Debye-Scherrer X-ray diffraction technique. Le Journal de Physique IV, 3. doi:10.1051/jp4:1993322
Bijkerk, F. (2001) Development of multilayer coatings and spin-off to XRL applications. Le Journal de Physique IV, 11. doi:10.1051/jp4:2001298
 
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