Reference Type | Journal (article/letter/editorial) |
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Title | SnO2-Semi-Conductor Heterojunction. Electrical Properties of a Particular MOS Structure |
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Journal | Japanese Journal of Applied Physics |
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Authors | Fillard, J. P. | Author |
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Manifacier, J. C. | Author |
Year | 1970 (August) | Volume | 9 |
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Issue | 8 |
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Publisher | Japan Society of Applied Physics |
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DOI | doi:10.1143/jjap.9.1012Search in ResearchGate |
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| Generate Citation Formats |
Mindat Ref. ID | 14978066 | Long-form Identifier | mindat:1:5:14978066:9 |
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GUID | 0 |
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Full Reference | Fillard, J. P., Manifacier, J. C. (1970) SnO2-Semi-Conductor Heterojunction. Electrical Properties of a Particular MOS Structure. Japanese Journal of Applied Physics, 9 (8) 1012-1013 doi:10.1143/jjap.9.1012 |
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Plain Text | Fillard, J. P., Manifacier, J. C. (1970) SnO2-Semi-Conductor Heterojunction. Electrical Properties of a Particular MOS Structure. Japanese Journal of Applied Physics, 9 (8) 1012-1013 doi:10.1143/jjap.9.1012 |
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In | (1970, August) Japanese Journal of Applied Physics Vol. 9 (8) Japan Society of Applied Physics |
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