Zhang, Haodong, Arutchelvan, Goutham, Meersschaut, Johan, Gaur, Abhinav, Conard, Thierry, Bender, Hugo, Lin, Dennis, Asselberghs, Inge, Heyns, Marc, Radu, Iuliana, Vandervorst, Wilfried, Delabie, Annelies (2017) MoS2 Functionalization with a Sub-nm Thin SiO2 Layer for Atomic Layer Deposition of High-κ Dielectrics. Chemistry of Materials, 29. 6772-6780 doi:10.1021/acs.chemmater.7b01695
| Reference Type | Journal (article/letter/editorial) | ||
|---|---|---|---|
| Title | MoS2 Functionalization with a Sub-nm Thin SiO2 Layer for Atomic Layer Deposition of High-κ Dielectrics | ||
| Journal | Chemistry of Materials | ||
| Authors | Zhang, Haodong | Author | |
| Arutchelvan, Goutham | Author | ||
| Meersschaut, Johan | Author | ||
| Gaur, Abhinav | Author | ||
| Conard, Thierry | Author | ||
| Bender, Hugo | Author | ||
| Lin, Dennis | Author | ||
| Asselberghs, Inge | Author | ||
| Heyns, Marc | Author | ||
| Radu, Iuliana | Author | ||
| Vandervorst, Wilfried | Author | ||
| Delabie, Annelies | Author | ||
| Year | 2017 (August 22) | Volume | 29 |
| Publisher | American Chemical Society (ACS) | ||
| DOI | doi:10.1021/acs.chemmater.7b01695Search in ResearchGate | ||
| Generate Citation Formats | |||
| Mindat Ref. ID | 4310593 | Long-form Identifier | mindat:1:5:4310593:5 |
| GUID | 0 | ||
| Full Reference | Zhang, Haodong, Arutchelvan, Goutham, Meersschaut, Johan, Gaur, Abhinav, Conard, Thierry, Bender, Hugo, Lin, Dennis, Asselberghs, Inge, Heyns, Marc, Radu, Iuliana, Vandervorst, Wilfried, Delabie, Annelies (2017) MoS2 Functionalization with a Sub-nm Thin SiO2 Layer for Atomic Layer Deposition of High-κ Dielectrics. Chemistry of Materials, 29. 6772-6780 doi:10.1021/acs.chemmater.7b01695 | ||
| Plain Text | Zhang, Haodong, Arutchelvan, Goutham, Meersschaut, Johan, Gaur, Abhinav, Conard, Thierry, Bender, Hugo, Lin, Dennis, Asselberghs, Inge, Heyns, Marc, Radu, Iuliana, Vandervorst, Wilfried, Delabie, Annelies (2017) MoS2 Functionalization with a Sub-nm Thin SiO2 Layer for Atomic Layer Deposition of High-κ Dielectrics. Chemistry of Materials, 29. 6772-6780 doi:10.1021/acs.chemmater.7b01695 | ||
| In | (2017) Chemistry of Materials Vol. 29. American Chemical Society (ACS) | ||
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