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Bobb-Semple, Dara, Nardi, Katie Lynn, Draeger, Nerissa, Hausmann, Dennis M., Bent, Stacey F. (2019) Area-Selective Atomic Layer Deposition Assisted by Self-Assembled Monolayers: A Comparison of Cu, Co, W, and Ru. Chemistry of Materials, 31. 1635-1645 doi:10.1021/acs.chemmater.8b04926

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Reference TypeJournal (article/letter/editorial)
TitleArea-Selective Atomic Layer Deposition Assisted by Self-Assembled Monolayers: A Comparison of Cu, Co, W, and Ru
JournalChemistry of Materials
AuthorsBobb-Semple, DaraAuthor
Nardi, Katie LynnAuthor
Draeger, NerissaAuthor
Hausmann, Dennis M.Author
Bent, Stacey F.Author
Year2019 (March 12)Volume31
PublisherAmerican Chemical Society (ACS)
DOIdoi:10.1021/acs.chemmater.8b04926Search in ResearchGate
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Mindat Ref. ID4313403Long-form Identifiermindat:1:5:4313403:4
GUID0
Full ReferenceBobb-Semple, Dara, Nardi, Katie Lynn, Draeger, Nerissa, Hausmann, Dennis M., Bent, Stacey F. (2019) Area-Selective Atomic Layer Deposition Assisted by Self-Assembled Monolayers: A Comparison of Cu, Co, W, and Ru. Chemistry of Materials, 31. 1635-1645 doi:10.1021/acs.chemmater.8b04926
Plain TextBobb-Semple, Dara, Nardi, Katie Lynn, Draeger, Nerissa, Hausmann, Dennis M., Bent, Stacey F. (2019) Area-Selective Atomic Layer Deposition Assisted by Self-Assembled Monolayers: A Comparison of Cu, Co, W, and Ru. Chemistry of Materials, 31. 1635-1645 doi:10.1021/acs.chemmater.8b04926
In(2019) Chemistry of Materials Vol. 31. American Chemical Society (ACS)

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Liu, Tzu-Ling, Nardi, Katie L., Draeger, Nerissa, Hausmann, Dennis M., Bent, Stacey F. (2020) Effect of Multilayer versus Monolayer Dodecanethiol on Selectivity and Pattern Integrity in Area-Selective Atomic Layer Deposition. ACS Applied Materials & Interfaces, 12 (37) 42226-42235 doi:10.1021/acsami.0c08873
Bergsman, David S., Liu, Tzu-Ling, Closser, Richard G., Nardi, Katie L., Draeger, Nerissa, Hausmann, Dennis M., Bent, Stacey F. (2018) Formation and Ripening of Self-Assembled Multilayers from the Vapor-Phase Deposition of Dodecanethiol on Copper Oxide. Chemistry of Materials, 30. 5694-5703 doi:10.1021/acs.chemmater.8b02150
Liu, Tzu-Ling, Zeng, Li, Nardi, Katie L., Hausmann, Dennis M., Bent, Stacey F. (2021) Characterizing Self-Assembled Monolayer Breakdown in Area-Selective Atomic Layer Deposition. Langmuir, 37 (39) 11637-11645 doi:10.1021/acs.langmuir.1c02211
Yu, Xiaoyun, Bobb-Semple, Dara, Oh, Il-Kwon, Liu, Tzu-Ling, Closser, Richard G., Trevillyan, William, Bent, Stacey F. (2021) Area-Selective Molecular Layer Deposition of a Silicon Oxycarbide Low-k Dielectric. Chemistry of Materials, 33 (3) 902-909 doi:10.1021/acs.chemmater.0c03668
Bobb-Semple, Dara, Zeng, Li, Cordova, Isvar, Bergsman, David S., Nordlund, Dennis, Bent, Stacey F. (2020) Substrate-Dependent Study of Chain Orientation and Order in Alkylphosphonic Acid Self-Assembled Monolayers for ALD Blocking. Langmuir, 36 (43) 12849-12857 doi:10.1021/acs.langmuir.0c01974
de Paula, Camila, Bobb-Semple, Dara, Bent, Stacey F. (2021) Increased selectivity in area-selective ALD by combining nucleation enhancement and SAM-based inhibition. Journal of Materials Research, 36 (3) 582-591 doi:10.1557/s43578-020-00013-4
Lee, Yujin, Rothman, Amnon, Shearer, Alexander B., Bent, Stacey F. (2025) Molecular Design in Area-Selective Atomic Layer Deposition: Understanding Inhibitors and Precursors. Chemistry of Materials, 37 (5). doi:10.1021/acs.chemmater.4c02902
Liu, Tzu-Ling, Bent, Stacey F. (2021) Area-Selective Atomic Layer Deposition on Chemically Similar Materials: Achieving Selectivity on Oxide/Oxide Patterns. Chemistry of Materials, 33 (2) 513-523 doi:10.1021/acs.chemmater.0c03227
Mackus, Adriaan J. M., Schneider, Joel R., MacIsaac, Callisto, Baker, Jon G., Bent, Stacey F. (2019) Synthesis of Doped, Ternary, and Quaternary Materials by Atomic Layer Deposition: A Review. Chemistry of Materials, 31. 1142-1183 doi:10.1021/acs.chemmater.8b02878
Shearer, Alexander, Pieck, Fabian, Yarbrough, Josiah, Werbrouck, Andreas, Tonner-Zech, Ralf, Bent, Stacey F. (2025) Role of Molecular Orientation: Comparison of Nitrogenous Aromatic Small Molecule Inhibitors for Area-Selective Atomic Layer Deposition. Chemistry of Materials, 37 (1). doi:10.1021/acs.chemmater.4c02231
Lee, Yujin, Seo, Seunggi, Shearer, Alexander B., Werbrouck, Andreas, Kim, Hyungjun, Bent, Stacey F. (2024) HfO2 Area-Selective Atomic Layer Deposition with a Carbon-Free Inhibition Layer. Chemistry of Materials, 36 (9) 4303-4314 doi:10.1021/acs.chemmater.3c03161
 
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