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Matsumura, S., Ohboshi, T., Oki, K., Tomokiyo, Y. (1991) High-voltage electron diffraction study of structure factors of Pd and Pt. Ultramicroscopy, 39 (1). 65-71 doi:10.1016/0304-3991(91)90183-7

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Reference TypeJournal (article/letter/editorial)
TitleHigh-voltage electron diffraction study of structure factors of Pd and Pt
JournalUltramicroscopy
AuthorsMatsumura, S.Author
Ohboshi, T.Author
Oki, K.Author
Tomokiyo, Y.Author
Year1991 (November)Volume39
Issue1
PublisherElsevier BV
DOIdoi:10.1016/0304-3991(91)90183-7Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID4896053Long-form Identifiermindat:1:5:4896053:1
GUID0
Full ReferenceMatsumura, S., Ohboshi, T., Oki, K., Tomokiyo, Y. (1991) High-voltage electron diffraction study of structure factors of Pd and Pt. Ultramicroscopy, 39 (1). 65-71 doi:10.1016/0304-3991(91)90183-7
Plain TextMatsumura, S., Ohboshi, T., Oki, K., Tomokiyo, Y. (1991) High-voltage electron diffraction study of structure factors of Pd and Pt. Ultramicroscopy, 39 (1). 65-71 doi:10.1016/0304-3991(91)90183-7
In(1991, November) Ultramicroscopy Vol. 39 (1) Elsevier BV

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Okuyama, T., Matsumura, S., Kuwano, N., Oki, K., Tomokiyo, Y. (1989) Dynamical diffraction effects on higher-order laue zone lines in CBED patterns of semiconductors. Ultramicroscopy, 31 (3). 309-317 doi:10.1016/0304-3991(89)90053-3
Ura, K. (1991) Design concept of a new ultra-high-voltage electron microscope at Osaka University. Ultramicroscopy, 39 (1). 1-7 doi:10.1016/0304-3991(91)90176-7
Tomokiyo, Y., Matsumura, S., Okuyama, T., Yasunaga, T., Kuwano, N., Oki, K. (1994) Dynamical diffraction effect on HOLZ-pattern geometry in Si-Ge alloys and determination of local lattice parameter. Ultramicroscopy, 54 (2). 276-285 doi:10.1016/0304-3991(94)90127-9
Tomokiyo, Y., Kuroiwa, T., Kinoshita, C. (1991) Defects occurring at or near surfaces in α-Al2O3 during electron irradiation. Ultramicroscopy, 39 (1). 213-221 doi:10.1016/0304-3991(91)90200-p
Kuroda, K., Morita, C., Arai, S., Yokoi, N., Saka, H. (1991) Convergent-beam electron diffraction in the high-voltage electron microscope with continuously variable reference voltage for lenses and alignments. Ultramicroscopy, 39 (1). 58-64 doi:10.1016/0304-3991(91)90182-6
Matsumura, Syo, Tomokiyo, Yoshitsugu, Oki, Kensuke (1989) Study of temperature factors in cubic crystals by high-voltage electron diffraction. Journal of Electron Microscopy Technique, 12 (3). 262-271 doi:10.1002/jemt.1060120309
Fujita, Hiroshi (1991) Atom clusters — new applications of high-voltage electron microscopy “micro-laboratory” to materials science. Ultramicroscopy, 39 (1). 369-381 doi:10.1016/0304-3991(91)90217-t
Nagakura, S., Hirotsu, Y., Sasaki, J., Miyagawa, K., Nakamura, Y., Brito, M.E. (1991) Degradation of the high-Tc superconductor YBa2Cu3O7-y studied by high-resolution electron microscopy. Ultramicroscopy, 39 (1). 254-267 doi:10.1016/0304-3991(91)90205-k
Seeger, A., Jin, N.Y., Phillipp, F., Zaiser, M. (1991) The study of self-organization processes in crystals by high-voltage electron microscopy. Ultramicroscopy, 39 (1). 342-354 doi:10.1016/0304-3991(91)90214-q
Seeger, Alfred, Phillipp, Fritz (1991) High-voltage electron microscopy in the Federal Republic of Germany: past, present, and future. Ultramicroscopy, 39 (1). 32-44 doi:10.1016/0304-3991(91)90179-a
Kiritani, Michio (1991) History, present status and future of the contribution of high-voltage electron microscopy to the study of radiation damage and defects in solids. Ultramicroscopy, 39 (1). 135-159 doi:10.1016/0304-3991(91)90193-a
 
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