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Yu, Suzhu, Wong, Terence K. S., Pita, Kantisara, Hu, Xiao, Ligatchev, Valeri (2002) Surface modified silica mesoporous films as a low dielectric constant intermetal dielectric. Journal of Applied Physics, 92 (6). 3338-3344 doi:10.1063/1.1499979

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Reference TypeJournal (article/letter/editorial)
TitleSurface modified silica mesoporous films as a low dielectric constant intermetal dielectric
JournalJournal of Applied Physics
AuthorsYu, SuzhuAuthor
Wong, Terence K. S.Author
Pita, KantisaraAuthor
Hu, XiaoAuthor
Ligatchev, ValeriAuthor
Year2002 (September 15)Volume92
Issue6
PublisherAIP Publishing
DOIdoi:10.1063/1.1499979Search in ResearchGate
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Mindat Ref. ID5116656Long-form Identifiermindat:1:5:5116656:0
GUID0
Full ReferenceYu, Suzhu, Wong, Terence K. S., Pita, Kantisara, Hu, Xiao, Ligatchev, Valeri (2002) Surface modified silica mesoporous films as a low dielectric constant intermetal dielectric. Journal of Applied Physics, 92 (6). 3338-3344 doi:10.1063/1.1499979
Plain TextYu, Suzhu, Wong, Terence K. S., Pita, Kantisara, Hu, Xiao, Ligatchev, Valeri (2002) Surface modified silica mesoporous films as a low dielectric constant intermetal dielectric. Journal of Applied Physics, 92 (6). 3338-3344 doi:10.1063/1.1499979
In(2002, September) Journal of Applied Physics Vol. 92 (6) AIP Publishing

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