Tangi, Malleswararao, De, Arpan, Shivaprasad, S. M. (2018) Role of dislocations and carrier concentration in limiting the electron mobility of InN films grown by plasma assisted molecular beam epitaxy. Journal of Applied Physics, 123 (1). 15701pp. doi:10.1063/1.5008903
Reference Type | Journal (article/letter/editorial) | ||
---|---|---|---|
Title | Role of dislocations and carrier concentration in limiting the electron mobility of InN films grown by plasma assisted molecular beam epitaxy | ||
Journal | Journal of Applied Physics | ||
Authors | Tangi, Malleswararao | Author | |
De, Arpan | Author | ||
Shivaprasad, S. M. | Author | ||
Year | 2018 (January 7) | Volume | 123 |
Issue | 1 | ||
Publisher | AIP Publishing | ||
DOI | doi:10.1063/1.5008903Search in ResearchGate | ||
Generate Citation Formats | |||
Mindat Ref. ID | 5208504 | Long-form Identifier | mindat:1:5:5208504:0 |
GUID | 0 | ||
Full Reference | Tangi, Malleswararao, De, Arpan, Shivaprasad, S. M. (2018) Role of dislocations and carrier concentration in limiting the electron mobility of InN films grown by plasma assisted molecular beam epitaxy. Journal of Applied Physics, 123 (1). 15701pp. doi:10.1063/1.5008903 | ||
Plain Text | Tangi, Malleswararao, De, Arpan, Shivaprasad, S. M. (2018) Role of dislocations and carrier concentration in limiting the electron mobility of InN films grown by plasma assisted molecular beam epitaxy. Journal of Applied Physics, 123 (1). 15701pp. doi:10.1063/1.5008903 | ||
In | (2018, January) Journal of Applied Physics Vol. 123 (1) AIP Publishing |
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