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Valade, L., Danjoy, C., Chansou, B., Rivi�re, E., Pellegatta, J.-L., Choukroun, R., Cassoux, P. (1998) Evaluation of the simultaneous use of Cp2VMe2 and CpTiCl2N(SiMe3)2 as precursors to ceramic thin films containing titanium and vanadium: Towards titanium-vanadium carbonitride. Applied Organometallic Chemistry, 12 (3). 173-187 doi:10.1002/(sici)1099-0739(199803)12:3<173::aid-aoc690>3.0.co;2-p

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Reference TypeJournal (article/letter/editorial)
TitleEvaluation of the simultaneous use of Cp2VMe2 and CpTiCl2N(SiMe3)2 as precursors to ceramic thin films containing titanium and vanadium: Towards titanium-vanadium carbonitride
JournalApplied Organometallic Chemistry
AuthorsValade, L.Author
Danjoy, C.Author
Chansou, B.Author
Rivi�re, E.Author
Pellegatta, J.-L.Author
Choukroun, R.Author
Cassoux, P.Author
Year1998 (March)Volume12
Issue3
PublisherWiley
DOIdoi:10.1002/(sici)1099-0739(199803)12:3<173::aid-aoc690>3.0.co;2-pSearch in ResearchGate
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Mindat Ref. ID7841214Long-form Identifiermindat:1:5:7841214:7
GUID0
Full ReferenceValade, L., Danjoy, C., Chansou, B., Rivi�re, E., Pellegatta, J.-L., Choukroun, R., Cassoux, P. (1998) Evaluation of the simultaneous use of Cp2VMe2 and CpTiCl2N(SiMe3)2 as precursors to ceramic thin films containing titanium and vanadium: Towards titanium-vanadium carbonitride. Applied Organometallic Chemistry, 12 (3). 173-187 doi:10.1002/(sici)1099-0739(199803)12:3<173::aid-aoc690>3.0.co;2-p
Plain TextValade, L., Danjoy, C., Chansou, B., Rivi�re, E., Pellegatta, J.-L., Choukroun, R., Cassoux, P. (1998) Evaluation of the simultaneous use of Cp2VMe2 and CpTiCl2N(SiMe3)2 as precursors to ceramic thin films containing titanium and vanadium: Towards titanium-vanadium carbonitride. Applied Organometallic Chemistry, 12 (3). 173-187 doi:10.1002/(sici)1099-0739(199803)12:33.0.co;2-p
In(1998, March) Applied Organometallic Chemistry Vol. 12 (3) Wiley

See Also

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Chansou, Benoit, Choukroun, Robert, Valade, Lydie (1997) Cp2TiCH2Si(Me2)NSiMe3: A Single-Source Precursor to Titanium-based Ceramic Thin Films by Chemical Vapor Deposition. Applied Organometallic Chemistry, 11 (3). 195-203 doi:10.1002/(sici)1099-0739(199703)11:3<195::aid-aoc541>3.0.co;2-q
Laine, R. M. (1998) Preface. Applied Organometallic Chemistry, 12 (3). 145 doi:10.1002/(sici)1099-0739(199803)12:3<145::aid-aoc1687>3.0.co;2-f
Laurent, F., Zhao, J.S., Valade, L., Choukroun, R., Cassoux, P. (1992) Thermoanalytic studies of the pyrolysis of CpTiCl2N(SiMe3)2 and its use as a precursor for the chemical vapor deposition of titanium carbonitride. Journal of Analytical and Applied Pyrolysis, 24 (1). 39-49 doi:10.1016/0165-2370(92)80003-5
Maury, Francis, Ossola, Franco (1998) Low-temperature MOCVD of chromium carbonitride coatings from tetrakis(diethylamido)chromium and pyrolysis mechanism of this single-source precursor. Applied Organometallic Chemistry, 12 (3). 189-199 doi:10.1002/(sici)1099-0739(199803)12:3<189::aid-aoc691>3.0.co;2-3
Kirss, Rein U., Meda, Lamartine (1998) Chemical vapor deposition of tungsten oxide. Applied Organometallic Chemistry, 12 (3). 155-160 doi:10.1002/(sici)1099-0739(199803)12:3<155::aid-aoc688>3.0.co;2-z
Wei, Wen-Cheng J., Lo, Ming-Hung (1998) Processing and properties of (Mo,Cr) oxycarbides from MOCVD. Applied Organometallic Chemistry, 12 (3). 201-220 doi:10.1002/(sici)1099-0739(199803)12:3<201::aid-aoc692>3.0.co;2-t
Laurent, Fran�ois, Michel, Philippe, Feurer, Roselyne, Morancho, Roland, Valade, Lydie, Choukroun, Robert, Cassoux, Patrick (1993) New organometallic route to vanadium carbonitride thin films. Journal of Materials Chemistry, 3. 659pp. doi:10.1039/jm9930300659
Hubert-Pfalzgraf, Liliane G., Guillon, Herv� (1998) Trends in precursor design for conventional and aerosol-assisted CVD of high-Tc superconductors. Applied Organometallic Chemistry, 12 (3). 221-236 doi:10.1002/(sici)1099-0739(199803)12:3<221::aid-aoc693>3.0.co;2-o
Hossenlopp, Jeanne M., Lamelas, F. J., Middleton, Kenneth, Rzepiela, Jeffrey A., Schmidt, Jason D., Zivkovic, Aleksandar (1998) Comparison of SnBr4 and di-n-butyl tin diacetate as laser-assisted chemical vapor deposition precursors for SnO2-based gas sensors. Applied Organometallic Chemistry, 12 (3). 147-154 doi:10.1002/(sici)1099-0739(199803)12:3<147::aid-aoc687>3.0.co;2-x
B�nnemann, Helmut (1998) Preface. Applied Organometallic Chemistry, 12 (5). 303 doi:10.1002/(sici)1099-0739(199805)12:5<303::aid-aoc742>3.0.co;2-e
Gomez-Ariza, J. L., S�nchez-Rodas, D., Beltran, R., Corns, W., Stockwel, P. (1998) Evaluation of atomic fluorescence spectrometry as a sensitive detection technique for arsenic speciation. Applied Organometallic Chemistry, 12 (6). 439-447 doi:10.1002/(sici)1099-0739(199806)12:6<439::aid-aoc718>3.0.co;2-8
 
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