Reference Type | Journal (article/letter/editorial) |
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Title | High‐throughput high‐yield fabrication of selectively doped AlxGa1−xAs/GaAs heterostructures by molecular beam epitaxy |
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Journal | Applied Physics Letters |
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Authors | Ploog, Klaus | Author |
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Fischer, Albrecht | Author |
Year | 1986 (May 19) | Volume | 48 |
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Issue | 20 |
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Publisher | AIP Publishing |
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DOI | doi:10.1063/1.96919Search in ResearchGate |
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| Generate Citation Formats |
Mindat Ref. ID | 8477592 | Long-form Identifier | mindat:1:5:8477592:2 |
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GUID | 0 |
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Full Reference | Ploog, Klaus, Fischer, Albrecht (1986) High‐throughput high‐yield fabrication of selectively doped AlxGa1−xAs/GaAs heterostructures by molecular beam epitaxy. Applied Physics Letters, 48 (20). 1392-1394 doi:10.1063/1.96919 |
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Plain Text | Ploog, Klaus, Fischer, Albrecht (1986) High‐throughput high‐yield fabrication of selectively doped AlxGa1−xAs/GaAs heterostructures by molecular beam epitaxy. Applied Physics Letters, 48 (20). 1392-1394 doi:10.1063/1.96919 |
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In | (1986, May) Applied Physics Letters Vol. 48 (20) AIP Publishing |
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