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Hoenk, Michael E., Chen, Howard Z., Yariv, Amnon, Morkoç, Hadis, Vahala, Kerry J. (1989) Cathodoluminescence measurement of an orientation dependent aluminum concentration in AlxGa1−xAs epilayers grown by molecular beam epitaxy on a nonplanar substrate. Applied Physics Letters, 54 (14). 1347-1349 doi:10.1063/1.100711

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Reference TypeJournal (article/letter/editorial)
TitleCathodoluminescence measurement of an orientation dependent aluminum concentration in AlxGa1−xAs epilayers grown by molecular beam epitaxy on a nonplanar substrate
JournalApplied Physics Letters
AuthorsHoenk, Michael E.Author
Chen, Howard Z.Author
Yariv, AmnonAuthor
Morkoç, HadisAuthor
Vahala, Kerry J.Author
Year1989 (April 3)Volume54
Issue14
PublisherAIP Publishing
DOIdoi:10.1063/1.100711Search in ResearchGate
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Mindat Ref. ID8486172Long-form Identifiermindat:1:5:8486172:4
GUID0
Full ReferenceHoenk, Michael E., Chen, Howard Z., Yariv, Amnon, Morkoç, Hadis, Vahala, Kerry J. (1989) Cathodoluminescence measurement of an orientation dependent aluminum concentration in AlxGa1−xAs epilayers grown by molecular beam epitaxy on a nonplanar substrate. Applied Physics Letters, 54 (14). 1347-1349 doi:10.1063/1.100711
Plain TextHoenk, Michael E., Chen, Howard Z., Yariv, Amnon, Morkoç, Hadis, Vahala, Kerry J. (1989) Cathodoluminescence measurement of an orientation dependent aluminum concentration in AlxGa1−xAs epilayers grown by molecular beam epitaxy on a nonplanar substrate. Applied Physics Letters, 54 (14). 1347-1349 doi:10.1063/1.100711
In(1989, April) Applied Physics Letters Vol. 54 (14) AIP Publishing


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