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Chen, W. K., Chen, J. C., Anthony, L., Liu, P. L. (1989) Metalorganic chemical vapor deposition of indium phosphide by pulsing precursors. Applied Physics Letters, 55 (10). 987-989 doi:10.1063/1.101697

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Reference TypeJournal (article/letter/editorial)
TitleMetalorganic chemical vapor deposition of indium phosphide by pulsing precursors
JournalApplied Physics Letters
AuthorsChen, W. K.Author
Chen, J. C.Author
Anthony, L.Author
Liu, P. L.Author
Year1989 (September 4)Volume55
Issue10
PublisherAIP Publishing
DOIdoi:10.1063/1.101697Search in ResearchGate
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Mindat Ref. ID8487726Long-form Identifiermindat:1:5:8487726:6
GUID0
Full ReferenceChen, W. K., Chen, J. C., Anthony, L., Liu, P. L. (1989) Metalorganic chemical vapor deposition of indium phosphide by pulsing precursors. Applied Physics Letters, 55 (10). 987-989 doi:10.1063/1.101697
Plain TextChen, W. K., Chen, J. C., Anthony, L., Liu, P. L. (1989) Metalorganic chemical vapor deposition of indium phosphide by pulsing precursors. Applied Physics Letters, 55 (10). 987-989 doi:10.1063/1.101697
In(1989, September) Applied Physics Letters Vol. 55 (10) AIP Publishing


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