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Chaudhari, Mrunalkumar, Du, Jincheng, Behera, Swayambhu, Manandhar, Sudha, Gaddam, Sneha, Kelber, Jeffry (2009) Fundamental mechanisms of oxygen plasma-induced damage of ultralow-k organosilicate materials: The role of thermal P3 atomic oxygen. Applied Physics Letters, 94 (20). 204102pp. doi:10.1063/1.3134487

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Reference TypeJournal (article/letter/editorial)
TitleFundamental mechanisms of oxygen plasma-induced damage of ultralow-k organosilicate materials: The role of thermal P3 atomic oxygen
JournalApplied Physics Letters
AuthorsChaudhari, MrunalkumarAuthor
Du, JinchengAuthor
Behera, SwayambhuAuthor
Manandhar, SudhaAuthor
Gaddam, SnehaAuthor
Kelber, JeffryAuthor
Year2009 (May 18)Volume94
Issue20
PublisherAIP Publishing
DOIdoi:10.1063/1.3134487Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID8574209Long-form Identifiermindat:1:5:8574209:1
GUID0
Full ReferenceChaudhari, Mrunalkumar, Du, Jincheng, Behera, Swayambhu, Manandhar, Sudha, Gaddam, Sneha, Kelber, Jeffry (2009) Fundamental mechanisms of oxygen plasma-induced damage of ultralow-k organosilicate materials: The role of thermal P3 atomic oxygen. Applied Physics Letters, 94 (20). 204102pp. doi:10.1063/1.3134487
Plain TextChaudhari, Mrunalkumar, Du, Jincheng, Behera, Swayambhu, Manandhar, Sudha, Gaddam, Sneha, Kelber, Jeffry (2009) Fundamental mechanisms of oxygen plasma-induced damage of ultralow-k organosilicate materials: The role of thermal P3 atomic oxygen. Applied Physics Letters, 94 (20). 204102pp. doi:10.1063/1.3134487
In(2009, May) Applied Physics Letters Vol. 94 (20) AIP Publishing


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