Reference Type | Journal (article/letter/editorial) |
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Title | Utilizing the interface adsorption of nitrogen for the growth of high-quality GaInAsN/GaAs quantum wells by metal organic chemical vapor deposition for near infrared applications |
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Journal | Applied Physics Letters |
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Authors | Albo, Asaf | Author |
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Cytermann, Catherine | Author |
Bahir, Gad | Author |
Fekete, Dan | Author |
Year | 2010 (April 5) | Volume | 96 |
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Issue | 14 |
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Publisher | AIP Publishing |
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DOI | doi:10.1063/1.3360216Search in ResearchGate |
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| Generate Citation Formats |
Mindat Ref. ID | 8582511 | Long-form Identifier | mindat:1:5:8582511:8 |
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GUID | 0 |
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Full Reference | Albo, Asaf, Cytermann, Catherine, Bahir, Gad, Fekete, Dan (2010) Utilizing the interface adsorption of nitrogen for the growth of high-quality GaInAsN/GaAs quantum wells by metal organic chemical vapor deposition for near infrared applications. Applied Physics Letters, 96 (14). 141102pp. doi:10.1063/1.3360216 |
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Plain Text | Albo, Asaf, Cytermann, Catherine, Bahir, Gad, Fekete, Dan (2010) Utilizing the interface adsorption of nitrogen for the growth of high-quality GaInAsN/GaAs quantum wells by metal organic chemical vapor deposition for near infrared applications. Applied Physics Letters, 96 (14). 141102pp. doi:10.1063/1.3360216 |
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In | (2010, April) Applied Physics Letters Vol. 96 (14) AIP Publishing |
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