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Lee, Hyo-Chang, Chung, Chin-Wook, Kim, J. H., Seong, D. J. (2019) Electron energy distribution modification by RF bias in Ar/SF6 inductively coupled plasmas. Applied Physics Letters, 115 (6). 64102pp. doi:10.1063/1.5110219

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Reference TypeJournal (article/letter/editorial)
TitleElectron energy distribution modification by RF bias in Ar/SF6 inductively coupled plasmas
JournalApplied Physics Letters
AuthorsLee, Hyo-ChangAuthor
Chung, Chin-WookAuthor
Kim, J. H.Author
Seong, D. J.Author
Year2019 (August 5)Volume115
Issue6
PublisherAIP Publishing
DOIdoi:10.1063/1.5110219Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID8659614Long-form Identifiermindat:1:5:8659614:3
GUID0
Full ReferenceLee, Hyo-Chang, Chung, Chin-Wook, Kim, J. H., Seong, D. J. (2019) Electron energy distribution modification by RF bias in Ar/SF6 inductively coupled plasmas. Applied Physics Letters, 115 (6). 64102pp. doi:10.1063/1.5110219
Plain TextLee, Hyo-Chang, Chung, Chin-Wook, Kim, J. H., Seong, D. J. (2019) Electron energy distribution modification by RF bias in Ar/SF6 inductively coupled plasmas. Applied Physics Letters, 115 (6). 64102pp. doi:10.1063/1.5110219
In(2019, August) Applied Physics Letters Vol. 115 (6) AIP Publishing

See Also

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Lee, Hyo-Chang, Lee, Min-Hyong, Chung, Chin-Wook (2010) Effects of rf-bias power on plasma parameters in a low gas pressure inductively coupled plasma. Applied Physics Letters, 96 (7). 71501pp. doi:10.1063/1.3293295
Lee, Hyo-Chang, Lee, Min-Hyong, Chung, Chin-Wook (2010) Experimental observation of the transition from nonlocal to local electron kinetics in inductively coupled plasmas. Applied Physics Letters, 96 (4). 41503pp. doi:10.1063/1.3291038
Lee, Min-Hyong, Lee, Hyo-Chang, Chung, Chin-Wook (2008) Observation of collisionless heating of low energy electrons in low pressure inductively coupled argon plasmas. Applied Physics Letters, 93 (23). 231503pp. doi:10.1063/1.3042264
Lee, Hyo-Chang, Kim, Dong-Hwan, Chung, Chin-Wook (2013) Discharge mode transition and hysteresis in inductively coupled plasma. Applied Physics Letters, 102 (23). 234104pp. doi:10.1063/1.4809925
Lee, Hyo-Chang, Seo, B. H., Kwon, Deuk-Chul, Kim, J. H., Seong, D. J., Oh, S. J., Chung, C.-W., You, K. H., Shin, ChaeHo (2017) Evolution of electron temperature in inductively coupled plasma. Applied Physics Letters, 110 (1). 14106pp. doi:10.1063/1.4971980
Kim, Young-Cheol, Kim, June Young, Lee, Hyo-Chang, Kim, Yu-Sin, Kim, Jin-Yong, Cho, Sung-Won, Chung, Chin-Wook (2015) Experimental verification of the Boltzmann relation at the wall in inductively coupled plasmas. Applied Physics Letters, 106 (7). 74103pp. doi:10.1063/1.4906575
Lee, Hyo-Chang, Chung, C.-W., Lee, M. H., Kim, J. H. (2021) Noninvasive method to measure the electron temperature in radio frequency capacitively coupled plasmas. Applied Physics Letters, 118 (20) 204101pp. doi:10.1063/5.0049186
Lee, Min-Hyong, Lee, Hyo-Chang, Chung, Chin-Wook (2010) Comparison of pressure dependence of electron energy distributions in oxygen capacitively and inductively coupled plasmas. Physical Review E, 81 (4) doi:10.1103/physreve.81.046402
Lee, Hyo-Chang, Chung, Chin-Wook (2012) Collisionless electron heating by radio frequency bias in low gas pressure inductive discharge. Applied Physics Letters, 101 (24). 244104pp. doi:10.1063/1.4770312
Lee, Min-Hyong, Lee, Hyo-Chang, Chung, Chin-Wook (2012) Effect of adding small amount of inductive fields to O2, Ar/O2 capacitively coupled plasmas. Journal of Applied Physics, 111 (9). 93301pp. doi:10.1063/1.4705362
Lee, Young-Kwang, Chung, Chin-Wook (2011) Ionization in inductively coupled argon plasmas studied by optical emission spectroscopy. Journal of Applied Physics, 109 (1). 13306pp. doi:10.1063/1.3530578
 
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