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Zarnani, H., Yu, Z. Q., Collins, G. J., Bhattacharya, E., Pankove, J. I. (1988) Windowless helium lamp assisted chemical vapor deposition of hydrogenated amorphous silicon. Applied Physics Letters, 53 (14). 1314-1316 doi:10.1063/1.100007

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Reference TypeJournal (article/letter/editorial)
TitleWindowless helium lamp assisted chemical vapor deposition of hydrogenated amorphous silicon
JournalApplied Physics Letters
AuthorsZarnani, H.Author
Yu, Z. Q.Author
Collins, G. J.Author
Bhattacharya, E.Author
Pankove, J. I.Author
Year1988 (October 3)Volume53
Issue14
PublisherAIP Publishing
DOIdoi:10.1063/1.100007Search in ResearchGate
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Mindat Ref. ID8484295Long-form Identifiermindat:1:5:8484295:0
GUID0
Full ReferenceZarnani, H., Yu, Z. Q., Collins, G. J., Bhattacharya, E., Pankove, J. I. (1988) Windowless helium lamp assisted chemical vapor deposition of hydrogenated amorphous silicon. Applied Physics Letters, 53 (14). 1314-1316 doi:10.1063/1.100007
Plain TextZarnani, H., Yu, Z. Q., Collins, G. J., Bhattacharya, E., Pankove, J. I. (1988) Windowless helium lamp assisted chemical vapor deposition of hydrogenated amorphous silicon. Applied Physics Letters, 53 (14). 1314-1316 doi:10.1063/1.100007
In(1988, October) Applied Physics Letters Vol. 53 (14) AIP Publishing

See Also

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Sheng, T. Y., Yu, Z. Q., Collins, G. J. (1988) Disk hydrogen plasma assisted chemical vapor deposition of aluminum nitride. Applied Physics Letters, 52 (7). 576-578 doi:10.1063/1.99398
Zarnani, H., Demiryont, H., Collins, G. J. (1986) Optical properties of UV laser photolytic deposition of hydrogenated amorphous silicon (a‐Si:H). Journal of Applied Physics, 60 (7). 2523-2529 doi:10.1063/1.337115
Bhattacharya, E., Pankove, J. I., Deb, S. K. (1987) Electric field and infrared‐induced recovery of metastability in amorphous hydrogenated silicon. Applied Physics Letters, 51 (13). 998-1000 doi:10.1063/1.98788
Pankove, J. I., Carlson, D. E. (1977) Photoluminescence of hydrogenated amorphous silicon. Applied Physics Letters, 31 (7). 450-451 doi:10.1063/1.89737
Shaw, Denis M., Sheng, Terry, Yu, Zengqi, Collins, George J., Adachi, Nobuo (1992) Photo-Deposition of Hydrogenated Amorphous Silicon on Downstream Substrates Using an Upstream Windowless Hydrogen Lamp. Japanese Journal of Applied Physics, 31. 3515-3517 doi:10.1143/jjap.31.3515
Pankove, J. I., Berkeyheiser, J. E. (1980) Light‐induced radiative recombination centers in hydrogenated amorphous silicon. Applied Physics Letters, 37 (8). 705-706 doi:10.1063/1.92052
Bhattacharya, Enakshi, Mahan, A. H., Crandall, Richard S., Pankove, J. I. (1989) Critical comparison of light‐induced changes in sub‐band‐gap absorption and photoconductivity in hydrogenated amorphous silicon. Applied Physics Letters, 54 (13). 1247-1249 doi:10.1063/1.100729
Weiler, M., Lang, K., Li, E., Robertson, J. (1998) Deposition of tetrahedral hydrogenated amorphous carbon using a novel electron cyclotron wave resonance reactor. Applied Physics Letters, 72 (11). 1314-1316 doi:10.1063/1.121069
Song, Y. J., Anderson, W. A. (1999) Improved hydrogenated amorphous silicon thin films by photon assisted microwave electron cyclotron resonance chemical vapor deposition. Applied Physics Letters, 74 (1). 67-69 doi:10.1063/1.122954
Pankove, J. I., Carlson, D. E. (1976) Electroluminescence in amorphous silicon. Applied Physics Letters, 29 (9). 620-622 doi:10.1063/1.89165
Ellis, F. B., Delahoy, A. E. (1985) Chemical vapor deposition of boron‐doped hydrogenated amorphous silicon. Applied Physics Letters, 47 (2). 135-137 doi:10.1063/1.96432
 
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