Reference Type | Journal (article/letter/editorial) |
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Title | Kinetics of the generation and annealing of deep defects and recombination centers in amorphous silicon |
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Journal | Applied Physics Letters |
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Authors | Shepard, K. | Author |
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Smith, Z E. | Author |
Aljishi, S. | Author |
Wagner, S. | Author |
Year | 1988 (October 24) | Volume | 53 |
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Issue | 17 |
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Publisher | AIP Publishing |
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DOI | doi:10.1063/1.99937Search in ResearchGate |
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| Generate Citation Formats |
Mindat Ref. ID | 8484568 | Long-form Identifier | mindat:1:5:8484568:3 |
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GUID | 0 |
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Full Reference | Shepard, K., Smith, Z E., Aljishi, S., Wagner, S. (1988) Kinetics of the generation and annealing of deep defects and recombination centers in amorphous silicon. Applied Physics Letters, 53 (17). 1644-1646 doi:10.1063/1.99937 |
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Plain Text | Shepard, K., Smith, Z E., Aljishi, S., Wagner, S. (1988) Kinetics of the generation and annealing of deep defects and recombination centers in amorphous silicon. Applied Physics Letters, 53 (17). 1644-1646 doi:10.1063/1.99937 |
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In | (1988, October) Applied Physics Letters Vol. 53 (17) AIP Publishing |
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