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Ide, Y., McDermott, B. T., Hashemi, M., Bedair, S. M., Goodhue, W. D. (1988) Sidewall growth by atomic layer epitaxy. Applied Physics Letters, 53 (23). 2314-2316 doi:10.1063/1.100264

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Reference TypeJournal (article/letter/editorial)
TitleSidewall growth by atomic layer epitaxy
JournalApplied Physics Letters
AuthorsIde, Y.Author
McDermott, B. T.Author
Hashemi, M.Author
Bedair, S. M.Author
Goodhue, W. D.Author
Year1988 (December 5)Volume53
Issue23
PublisherAIP Publishing
DOIdoi:10.1063/1.100264Search in ResearchGate
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Mindat Ref. ID8485057Long-form Identifiermindat:1:5:8485057:9
GUID0
Full ReferenceIde, Y., McDermott, B. T., Hashemi, M., Bedair, S. M., Goodhue, W. D. (1988) Sidewall growth by atomic layer epitaxy. Applied Physics Letters, 53 (23). 2314-2316 doi:10.1063/1.100264
Plain TextIde, Y., McDermott, B. T., Hashemi, M., Bedair, S. M., Goodhue, W. D. (1988) Sidewall growth by atomic layer epitaxy. Applied Physics Letters, 53 (23). 2314-2316 doi:10.1063/1.100264
In(1988, December) Applied Physics Letters Vol. 53 (23) AIP Publishing


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