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Edge, L. F., Schlom, D. G., Rivillon, S., Chabal, Y. J., Agustin, M. P., Stemmer, S., Lee, T., Kim, M. J., Craft, H. S., Maria, J.-P., Hawley, M. E., Holländer, B., Schubert, J., Eisenbeiser, K. (2006) Thermal stability of amorphous LaScO3 films on silicon. Applied Physics Letters, 89 (6). 62902pp. doi:10.1063/1.2222302

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Reference TypeJournal (article/letter/editorial)
TitleThermal stability of amorphous LaScO3 films on silicon
JournalApplied Physics Letters
AuthorsEdge, L. F.Author
Schlom, D. G.Author
Rivillon, S.Author
Chabal, Y. J.Author
Agustin, M. P.Author
Stemmer, S.Author
Lee, T.Author
Kim, M. J.Author
Craft, H. S.Author
Maria, J.-P.Author
Hawley, M. E.Author
Holländer, B.Author
Schubert, J.Author
Eisenbeiser, K.Author
Year2006 (August 7)Volume89
Issue6
PublisherAIP Publishing
DOIdoi:10.1063/1.2222302Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID8552087Long-form Identifiermindat:1:5:8552087:9
GUID0
Full ReferenceEdge, L. F., Schlom, D. G., Rivillon, S., Chabal, Y. J., Agustin, M. P., Stemmer, S., Lee, T., Kim, M. J., Craft, H. S., Maria, J.-P., Hawley, M. E., Holländer, B., Schubert, J., Eisenbeiser, K. (2006) Thermal stability of amorphous LaScO3 films on silicon. Applied Physics Letters, 89 (6). 62902pp. doi:10.1063/1.2222302
Plain TextEdge, L. F., Schlom, D. G., Rivillon, S., Chabal, Y. J., Agustin, M. P., Stemmer, S., Lee, T., Kim, M. J., Craft, H. S., Maria, J.-P., Hawley, M. E., Holländer, B., Schubert, J., Eisenbeiser, K. (2006) Thermal stability of amorphous LaScO3 films on silicon. Applied Physics Letters, 89 (6). 62902pp. doi:10.1063/1.2222302
In(2006, August) Applied Physics Letters Vol. 89 (6) AIP Publishing

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Edge, L. F., Schlom, D. G., Sivasubramani, P., Wallace, R. M., Holländer, B., Schubert, J. (2006) Electrical characterization of amorphous lanthanum aluminate thin films grown by molecular-beam deposition on silicon. Applied Physics Letters, 88 (11). 112907pp. doi:10.1063/1.2182019
Sivasubramani, P., Lee, T. H., Kim, M. J., Kim, J., Gnade, B. E., Wallace, R. M., Edge, L. F., Schlom, D. G., Stevie, F. A., Garcia, R., Zhu, Z., Griffis, D. P. (2006) Thermal stability of lanthanum scandate dielectrics on Si(100). Applied Physics Letters, 89 (24). 242907pp. doi:10.1063/1.2405418
Sivasubramani, P., Kim, M. J., Gnade, B. E., Wallace, R. M., Edge, L. F., Schlom, D. G., Craft, H. S., Maria, J.-P. (2005) Outdiffusion of La and Al from amorphous LaAlO3 in direct contact with Si (001). Applied Physics Letters, 86 (20). 201901pp. doi:10.1063/1.1928316
Edge, L. F., Schlom, D. G., Chambers, S. A., Cicerrella, E., Freeouf, J. L., Holländer, B., Schubert, J. (2004) Measurement of the band offsets between amorphous LaAlO3 and silicon. Applied Physics Letters, 84 (5). 726-728 doi:10.1063/1.1644055
Durğun Özben, E., Lopes, J. M. J., Roeckerath, M., Lenk, St., Holländer, B., Jia, Y., Schlom, D. G., Schubert, J., Mantl, S. (2008) SmScO3 thin films as an alternative gate dielectric. Applied Physics Letters, 93 (5). 52902pp. doi:10.1063/1.2968660
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Melville, A., Mairoser, T., Schmehl, A., Fischer, M., Gsell, S., Schreck, M., Awschalom, D. D., Heeg, T., Holländer, B., Schubert, J., Schlom, D. G. (2013) Epitaxial growth of europium monoxide on diamond. Applied Physics Letters, 103 (22). 222402pp. doi:10.1063/1.4833550
 
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