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Kwon, Jang-Yeon, Jung, Ji Sim, Son, Kyoung Seok, Lee, Kwang-Hee, Park, Joon Seok, Kim, Tae Sang, Park, Jin-Seong, Choi, Rino, Jeong, Jae Kyeong, Koo, Bonwon, Lee, Sang Yoon (2010) The impact of gate dielectric materials on the light-induced bias instability in Hf–In–Zn–O thin film transistor. Applied Physics Letters, 97 (18). 183503pp. doi:10.1063/1.3513400

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Reference TypeJournal (article/letter/editorial)
TitleThe impact of gate dielectric materials on the light-induced bias instability in Hf–In–Zn–O thin film transistor
JournalApplied Physics Letters
AuthorsKwon, Jang-YeonAuthor
Jung, Ji SimAuthor
Son, Kyoung SeokAuthor
Lee, Kwang-HeeAuthor
Park, Joon SeokAuthor
Kim, Tae SangAuthor
Park, Jin-SeongAuthor
Choi, RinoAuthor
Jeong, Jae KyeongAuthor
Koo, BonwonAuthor
Lee, Sang YoonAuthor
Year2010 (November)Volume97
Issue18
PublisherAIP Publishing
DOIdoi:10.1063/1.3513400Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID8587839Long-form Identifiermindat:1:5:8587839:6
GUID0
Full ReferenceKwon, Jang-Yeon, Jung, Ji Sim, Son, Kyoung Seok, Lee, Kwang-Hee, Park, Joon Seok, Kim, Tae Sang, Park, Jin-Seong, Choi, Rino, Jeong, Jae Kyeong, Koo, Bonwon, Lee, Sang Yoon (2010) The impact of gate dielectric materials on the light-induced bias instability in Hf–In–Zn–O thin film transistor. Applied Physics Letters, 97 (18). 183503pp. doi:10.1063/1.3513400
Plain TextKwon, Jang-Yeon, Jung, Ji Sim, Son, Kyoung Seok, Lee, Kwang-Hee, Park, Joon Seok, Kim, Tae Sang, Park, Jin-Seong, Choi, Rino, Jeong, Jae Kyeong, Koo, Bonwon, Lee, Sang Yoon (2010) The impact of gate dielectric materials on the light-induced bias instability in Hf–In–Zn–O thin film transistor. Applied Physics Letters, 97 (18). 183503pp. doi:10.1063/1.3513400
In(2010, November) Applied Physics Letters Vol. 97 (18) AIP Publishing


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