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Eser, E., Urbanski, E. (1988) Response to ‘‘Comment on ‘Photodegradation in hydrogenated amorphous silicon films at a high level of illumination’ ’’ [Appl. Phys. Lett.53, 1768 (1988)]. Applied Physics Letters, 53 (18). 1769 doi:10.1063/1.99778

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Reference TypeJournal (article/letter/editorial)
TitleResponse to ‘‘Comment on ‘Photodegradation in hydrogenated amorphous silicon films at a high level of illumination’ ’’ [Appl. Phys. Lett.53, 1768 (1988)]
JournalApplied Physics Letters
AuthorsEser, E.Author
Urbanski, E.Author
Year1988 (October 31)Volume53
Issue18
PublisherAIP Publishing
DOIdoi:10.1063/1.99778Search in ResearchGate
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Mindat Ref. ID8484608Long-form Identifiermindat:1:5:8484608:0
GUID0
Full ReferenceEser, E., Urbanski, E. (1988) Response to ‘‘Comment on ‘Photodegradation in hydrogenated amorphous silicon films at a high level of illumination’ ’’ [Appl. Phys. Lett.53, 1768 (1988)]. Applied Physics Letters, 53 (18). 1769 doi:10.1063/1.99778
Plain TextEser, E., Urbanski, E. (1988) Response to ‘‘Comment on ‘Photodegradation in hydrogenated amorphous silicon films at a high level of illumination’ ’’ [Appl. Phys. Lett.53, 1768 (1988)]. Applied Physics Letters, 53 (18). 1769 doi:10.1063/1.99778
In(1988, October) Applied Physics Letters Vol. 53 (18) AIP Publishing

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Fang, P. H. (1988) Comment on ‘‘Photodegradation in hydrogenated amorphous silicon films at a high level of illumination’’ [Appl. Phys. Lett.51, 2124 (1987)]. Applied Physics Letters, 53 (18). 1768 doi:10.1063/1.100394
Eser, E., Urbanski, E. (1987) Photodegradation in hydrogenated amorphous silicon films at a high level of illumination. Applied Physics Letters, 51 (25). 2124-2126 doi:10.1063/1.98967
Trillo, S., Wabnitz, S. (1988) Response to ‘‘Comment on ‘Optical multistability and phase conjugation fidelity in a high‐birefringence optical fiber’ ’’ [Appl. Phys. Lett.53, 165 (1988)]. Applied Physics Letters, 53 (2). 165 doi:10.1063/1.100418
Tachi, Shinichi, Tsujimoto, Kazunori, Okudaira, Sadayuki (1988) Response to ‘‘Comment on ‘Low‐temperature reactive ion etching and microwave plasma etching of silicon’ ’’ [Appl. Phys. Lett.53, 1665 (1988)]. Applied Physics Letters, 53 (17). 1666-1667 doi:10.1063/1.99793
Dodson, Brian W., Tsao, Jeffrey Y. (1988) Response to ‘‘Comment on ‘Relaxation of strained‐layer semiconductor structures via plastic flow’ ’’ [Appl. Phys. Lett.53, 1127 (1988)]. Applied Physics Letters, 53 (12). 1128 doi:10.1063/1.100036
Raja, M. Y. A., Brueck, S. R. J., Osinski, M., McInerney, J. (1988) Response to ‘‘Comment on ‘Laser‐induced degradation of GaAs photoluminescence’ ’’ [Appl. Phys. Lett.53, 927 (1988)]. Applied Physics Letters, 53 (10). 927-928 doi:10.1063/1.100073
Pelletier, J. (1988) Comment on ‘‘Low‐temperature reactive ion etching and microwave plasma etching of silicon’’ [Appl. Phys. Lett. 52, 616 (1988)]. Applied Physics Letters, 53 (17). 1665-1666 doi:10.1063/1.99792
People, R. (1988) Comment on ‘‘Relaxation of strained‐layer semiconductor structures via plastic flow’’ [Appl. Phys. Lett. 51, 1325 (1987); 52, 852(E) (1988)]. Applied Physics Letters, 53 (12). 1127 doi:10.1063/1.100035
Landauer, Rolf (1988) Response to ‘‘Comment on ‘Energy requirements in communication’ ’’ [Appl. Phys. Lett.52, 2191 (1988)]. Applied Physics Letters, 52 (25). 2191-2192 doi:10.1063/1.99532
Guidotti, Daniel, Hovel, Harold J. (1988) Comment on ‘‘Laser‐induced degradation of GaAs photoluminescence’’ [Appl. Phys. Lett.52, 625 (1988)]. Applied Physics Letters, 53 (10). 927 doi:10.1063/1.100072
Vatarescu, A. (1988) Comment on ‘‘Optical multistability and phase conjugation fidelity in a high‐birefringence optical fiber’’ [Appl. Phys. Lett.51, 555 (1987)]. Applied Physics Letters, 53 (2). 165 doi:10.1063/1.100354
 
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